The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

Jun. 27, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Stefan Eyring, Weilburg, DE;

Frank Laske, WeilmĂĽnster, DE;

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G01B 15/00 (2006.01); G01B 21/00 (2006.01); G03F 1/36 (2012.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G01B 15/00 (2013.01); G01B 21/00 (2013.01); G03F 1/36 (2013.01); H01L 22/00 (2013.01);
Abstract

An apparatus and a method are disclosed for the measurement of pattern placement and/or edge placement and/or size of a pattern on a surface of a substrate for the semiconductor industry. At least one source for detection and at least one assigned detector are used to measure the positions of a pattern on a substrate. With a movable stage the substrate is moved while detection takes place. A displacement measurement system determines the position of the movable stage during the movement. A computer is used for correlating detected signals of the at least one detector along the derived trace line with the actual positions of the stage during the movement of the stage.


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