Company Filing History:
Years Active: 2019
Title: Thomas Heidrich: Innovator in Overlay Metrology
Introduction
Thomas Heidrich is a notable inventor based in Weilburg, Germany. He has made significant contributions to the field of overlay metrology, particularly through his innovative patent. His work focuses on enhancing the accuracy of measurements in complex target structures.
Latest Patents
Heidrich holds a patent for an overlay metrology system that utilizes particle-beam technology. The patent, titled "Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals," describes a system that scans a particle beam across an overlay target. This target includes both a first-layer and a second-layer target element. The system is designed to determine symmetry measurements from the scan signal, which helps in generating an overlay measurement that indicates any misalignment between the two layers.
Career Highlights
Heidrich's career is marked by his role at Kla Tencor Corporation, where he has applied his expertise in metrology. His innovative approach has led to advancements in the accuracy of overlay measurements, which are crucial in semiconductor manufacturing.
Collaborations
Heidrich has worked alongside talented colleagues such as Nadav Gutman and Eran Amit. Their collaborative efforts have contributed to the development of cutting-edge technologies in the field of overlay metrology.
Conclusion
Thomas Heidrich's contributions to overlay metrology exemplify the importance of innovation in technology. His patent and work at Kla Tencor Corporation highlight his role as a key figure in advancing measurement techniques in the semiconductor industry.