The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Sep. 28, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Inna Steely-Tarshish, Yokneam Ilit, IL;

Stefan Eyring, Weilburg, DE;

Mark Ghinovker, Yoqneam Ilit, IL;

Yoel Feler, Haifa, IL;

Eitan Hajaj, Ashqelon, IL;

Ulrich Pohlmann, Jena, DE;

Nadav Gutman, Zichron Ya'aqov, IL;

Chris Steely, Yokneam Ilit, IL;

Raviv Yohanan, Qiryat Motzkin, IL;

Ira Naot, Milpitas, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01N 21/47 (2006.01); G01N 21/95 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01N 21/4785 (2013.01); G01N 21/4788 (2013.01); G01N 21/9501 (2013.01); G03F 7/70625 (2013.01);
Abstract

Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing.


Find Patent Forward Citations

Loading…