The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Apr. 16, 2024
Kla Corporation, Milpitas, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system may receive a plurality of candidate design variations of a target layout of an overlay target. A metrology system may determine one or more process-induced target defects for the plurality of candidate design variations when fabricated with a known fabrication process. A metrology system may determine one or more process-induced overlay errors associated with the one or more process-induced target defects for the plurality of candidate design variations when measured with a known metrology recipe. A metrology system may select a final design variation from the plurality of candidate design variations that provides a smallest aggregate overlay error based on the one or more process-induced overlay errors.