The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Aug. 18, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Anna Golotsvan, Qiryat Tivon, IL;
Inna Steely-Tarshish, Haifa, IL;
Mark Ghinovker, Yoqneam Ilit, IL;
Rawi Dirawi, Milpitas, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G03F 7/00 (2006.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01N 21/47 (2013.01); G01N 23/2251 (2013.01); G03F 7/70608 (2013.01); G03F 7/70683 (2013.01); G01N 2223/07 (2013.01);
Abstract
A metrology target includes a first set of pattern elements compatible with a first metrology mode along one or more directions, and a second set of pattern elements compatible with a second metrology mode along one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.