Company Filing History:
Years Active: 2023
Title: Rawi Dirawi: Innovator in Composite Overlay Metrology
Introduction: Rawi Dirawi is a prominent inventor based in Milpitas, CA, known for his significant contributions to the field of metrology. With a focus on advanced measurement technologies, he has developed inventions that enhance the precision and effectiveness of metrology targets.
Latest Patents: Rawi holds one patent titled "Composite Overlay Metrology Target." This innovative patent describes a metrology target that includes a first set of pattern elements compatible with a first metrology mode, alongside a second set of pattern elements organized in a unique configuration. The second set includes a portion of the first set, surrounded by additional elements that are not part of this second set. This design helps streamline the measurement process, which is critical in various applications, particularly in semiconductor manufacturing.
Career Highlights: Rawi Dirawi is currently associated with Kla Corporation, a leading company in the development of advanced metrology systems. His work focuses on improving measurement technologies that are essential for ensuring quality and accuracy in production processes. His innovative contributions are instrumental in pushing the boundaries of technology in this field.
Collaborations: Within his career, Rawi has had the opportunity to collaborate with notable colleagues such as Anna Golotsvan and Inna Steely-Tarshish. These collaborations reflect a strong team dynamic and a shared commitment to advancing metrology research and application practices.
Conclusion: Rawi Dirawi stands out as a skilled inventor whose work in composite overlay metrology targets is paving the way for advancements in measurement technologies. His patent not only showcases his innovative spirit but also contributes significantly to the field, underscoring the importance of precision in technological advancements within the industry.