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Anna Golotsvan

USPTO Granted Patents = 13 (Patent Applications = 1)

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 14(Granted Patents)

Location History:

Milpitas, CA (US) (2023)
Qiryat Tivon, IL (2022 - 2024)

Company Filing History:

Kla Tencor Corporation

patents

1 out of 832,843

Other

patents

Years Active: 2022-2025

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12222199 - Systems and methods for measurement of misregistration and amelioration thereof (2025-02-11),

2. 12013634 - Reduction or elimination of pattern placement error in metrology measurements (2024-06-18),

3. 12001148 - Enhancing performance of overlay metrology (2024-06-04),

4. 11862521 - Multiple-tool parameter set calibration and misregistration measurement system and method (2024-01-02),

5. 11809090 - Composite overlay metrology target (2023-11-07),

6. 11761969 - System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedback (2023-09-19),

7. 11726410 - Multi-resolution overlay metrology targets (2023-08-15),

8. 11615974 - Fab management with dynamic sampling plans, optimized wafer measurement paths and optimized wafer transport, using quantum computing (2023-03-28),

9. 11592755 - Enhancing performance of overlay metrology (2023-02-28),

10. 11551980 - Dynamic amelioration of misregistration measurement (2023-01-10),

11. 11537043 - Reduction or elimination of pattern placement error in metrology measurements (2022-12-27),

12. 11353799 - System and method for error reduction for metrology measurements (2022-06-07),

13. 11353493 - Data-driven misregistration parameter configuration and measurement system and method (2022-06-07),

Title: The Innovative Mind of Anna Golotsvan

Introduction

Anna Golotsvan is a distinguished inventor based in Qiryat Tivon, Israel. She has been granted an impressive total of 13 patents, showcasing her remarkable contributions to the field of metrology and precision measurement technologies. Her work is pivotal in addressing critical challenges in pattern placement and process variations in device manufacturing.

Latest Patents

Among her latest innovations, Anna has developed systems and methods for the measurement of misregistration aimed at improving the accuracy of misregistration metrology tools (MMT). This sophisticated system incorporates a database containing various process variation categories, enabling a precise association of measurement sites with their corresponding parameter sets. Additionally, her patent on reducing or eliminating pattern placement errors introduces advanced metrology methods that utilize sub-resolved assist features in mask designs, significantly enhancing both device printability and measurement reliability.

Career Highlights

Throughout her career, Anna has held key positions in notable organizations, including KLA Corporation and KLA-Tencor Corporation. Her work in these companies has further solidified her reputation as an innovative thinker and problem-solver in the technological landscape of metrology.

Collaborations

Anna has collaborated with talented individuals in her field, including colleagues Roie Volkovich and Amnon Manassen. These partnerships have enhanced her ability to drive innovation and contribute effectively to complex projects, leading to advancements in metrology techniques.

Conclusion

Anna Golotsvan's contributions to the field of metrology and precision measurement are significant and impactful. With her impressive portfolio of patents and collaborations, she continues to pave the way for future innovations. Her dedication to improving measurement technologies not only exemplifies her inventive spirit but also serves as an inspiration for aspiring inventors in the field.

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