The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2022
Filed:
Jul. 14, 2020
Kla Corporation, Milpitas, CA (US);
Roie Volkovich, Hadera, IL;
Liran Yerushalmi, Zicron Yaacob, IL;
Anna Golotsvan, Qiryat Tivon, IL;
Rawi Dirawi, Nazareth, IL;
Chen Dror, Tivon, IL;
Nir BenDavid, Migdal Ha'emek, IL;
Amnon Manassen, Haifa, IL;
Oren Lahav, Adi, IL;
Shlomit Katz, Beit Hanania, IL;
Other;
Abstract
A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.