Company Filing History:
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1 out of 832,843 Years Active: 2022
Title: Oren Lahav: Innovator in Metrology and Imaging Technologies
Introduction
Oren Lahav is a notable inventor based in Adi, Israel. He has made significant contributions to the fields of metrology and imaging technologies. With a total of 2 patents, his work focuses on enhancing measurement accuracy and imaging techniques.
Latest Patents
Lahav's latest patents include a "System and method for error reduction for metrology measurements." This innovative metrology system features a controller that is communicatively coupled to various metrology tools. The controller utilizes processors to execute program instructions that receive metrology measurements from targets within a sample. It determines errors based on these measurements and identifies correctables to adjust sources of error, ultimately reducing noise in the measurements.
Another significant patent is the "Ptychography based system and method." This system is designed for imaging objects located in an object plane. It comprises an optical system and a detection device, utilizing a single shot ptychography arrangement to create light response patterns during a single exposure session. The system applies predetermined coding functions to the illuminating light and the collected light response, resulting in coded image data.
Career Highlights
Throughout his career, Oren Lahav has worked with various organizations, including Technion Research & Development Foundation Limited. His expertise in metrology and imaging has positioned him as a valuable contributor to technological advancements in these fields.
Collaborations
Lahav has collaborated with notable individuals such as Roie Volkovich and Liran Yerushalmi. These collaborations have further enriched his work and contributed to the development of innovative solutions in his areas of expertise.
Conclusion
Oren Lahav's contributions to metrology and imaging technologies through his patents demonstrate his commitment to innovation. His work continues to influence advancements in measurement accuracy and imaging techniques.