The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2025

Filed:

Aug. 01, 2022
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Amnon Manassen, Haifa, IL;

Yoav Grauer, Haifa, IL;

Shlomo Eisenbach, Milpitas, CA (US);

Stephen Hiebert, Milpitas, CA (US);

Avner Safrani, Misgav, IL;

Roel Gronheid, Leuven, BE;

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/06 (2006.01); G01B 17/06 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 11/0608 (2013.01); G01B 17/06 (2013.01); G01N 21/9505 (2013.01);
Abstract

Systems and methods for generating volumetric data are disclosed. Such systems and methods may include scanning a sample at a plurality of focal planes located along a depth direction of the sample. Such systems and methods may include generating, via a detector of a metrology sub-system, a plurality of images of a volumetric field of view of the sample at the plurality of focal planes. Such systems and methods may include aggregating the plurality of images to generate volumetric data of the volumetric field of view of the sample. The metrology sub-system may include a Linnik interferometer.


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