The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Sep. 28, 2022
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Nireekshan K. Reddy, Tel Aviv, IL;

Vladimir Levinski, Nazareth Ilit, IL;

Amnon Manassen, Haifa, IL;

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/01 (2006.01); G03F 7/00 (2006.01); G01N 21/59 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G03F 7/705 (2013.01); G01N 21/01 (2013.01); G01N 2021/5957 (2013.01); G01N 21/956 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01);
Abstract

A metrology system may arrange metrology measurements for a plurality of metrology targets distributed in a plurality of fields on one or samples into a signal vector, where the metrology measurements associated with the metrology targets in each of the plurality of fields are grouped within the signal vector. The system may further decompose the signal vector into reconstruction vectors associated with different spectral components of the signal vector. The system may further classify a subset of the reconstruction vectors as components of a metrology model, where a sum of the components corresponds to a metrology model describing the metrology measurements on the one or more samples. The system may further generate control signals to control one or more processing tools based on the metrology model.


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