The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Jun. 20, 2023
Kla Corporation, Milpitas, CA (US);
Amnon Manassen, Haifa, IL;
Yonatan Vaknin, Yoqneam Llit, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
An overlay metrology system may include an illumination source to generate illumination including two or more spectral bands having two or more center wavelengths. The system may include an optical sub-system to illuminate and image a sample, where the sample in accordance with the metrology recipe includes one or more cells with grating-over-grating structures formed as overlapping gratings with different pitches in different sample layers. The system may include collection pupil components to exclusively pass, for each of the two or more center wavelengths, two diffraction lobes from each of the different pitches of the grating-over-grating structures. A controller may receive images of the sample from the detectors generated in accordance with the metrology recipe and generate overlay measurements between at least some of the different layers of the sample based on the images.