The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Aug. 31, 2020
Siemens Industry Software Inc., Plano, TX (US);
Hyejin Jin, Palo Alto, CA (US);
John L. Sturtevant, Portland, OR (US);
Shumay D. Shang, Saratoga, CA (US);
Azat Latypov, San Jose, CA (US);
Germain Louis Fenger, Gladstone, OR (US);
Gurdaman Khaira, Beaverton, OR (US);
Siemens Industry Software Inc., Plano, TX (US);
Abstract
Systems and methods for calculating a printed area metric indicative of stochastic variations of the lithographic process are disclosed. Lithography is a process that uses light to transfer a geometric pattern from a photomask, based on a layout design, to a resist on a substrate. The lithographic process is subject to random stochastic phenomena, with the resulting stochastic randomness potentially becoming a major challenge. To characterize the stochastic phenomena, a printed area metric may be generated analytically (rather than via simulations) and comprise one or more defined moments for a printed area distribution associated with the printed area that are indicative of one or more aspects associated with printing. For example, the printed area metric may be indicative of the likelihood of printing within the printed area or the variance of printing within the printed area due to stochastic randomness in one or both of exposure or resist process.