Company Filing History:
Years Active: 2011-2023
Title: Innovations of Shumay Dou Shang
Introduction
Shumay Dou Shang is an accomplished inventor based in Saratoga, California. He holds a total of four patents, showcasing his expertise in advanced technologies. His work primarily focuses on machine learning and lithographic processes, contributing significantly to the fields of design and manufacturing.
Latest Patents
One of his latest patents is titled "Machine learning-based clustering for curvilinear layout designs." This invention relates to techniques for classifying layout patterns by extracting density feature vectors from layout regions. The process involves using a set of non-overlapping rings that cover a circular area, followed by a machine learning-based clustering process to categorize layout features into distinct clusters. Each cluster can be further divided into subclusters based on specific properties.
Another notable patent is "Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process." This invention addresses the challenges posed by stochastic phenomena in lithography, which is essential for transferring geometric patterns onto substrates. The patent describes a method for generating a printed area metric analytically, which characterizes the stochastic variations in the printing process, thereby enhancing the reliability of lithographic outcomes.
Career Highlights
Shumay has worked with prominent companies in the technology sector, including Mentor Graphics Corporation and Siemens Industry Software GmbH. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in design and manufacturing technologies.
Collaborations
Throughout his career, Shumay has collaborated with notable professionals, including John L. Sturtevant and Lisa Swallow. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Shumay Dou Shang is a distinguished inventor whose contributions to machine learning and lithography have made a significant impact in the technology industry. His innovative patents reflect his commitment to advancing design methodologies and improving manufacturing processes.