The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Sep. 30, 2005
Shumay Dou Shang, Saratoga, CA (US);
Lisa Swallow, Lake Oswego, OR (US);
Yuri Granik, Palo Alto, CA (US);
Shumay Dou Shang, Saratoga, CA (US);
Lisa Swallow, Lake Oswego, OR (US);
Yuri Granik, Palo Alto, CA (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features. Mask layout data for one or more subresolution assist features (SRAFs) is then defined to approximate one or more non-printing features of the optimized mask layout pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile