Location History:
- Fremont, CA (US) (2003)
- Portland, OR (US) (2014)
- Palo Alto, CA (US) (2005 - 2021)
Company Filing History:
17 out of 672 
1 out of 209 
1 out of 3 Years Active: 2003-2021
Title: Innovations of Yuri Granik in Lithography
Introduction: Yuri Granik is a prominent inventor based in Palo Alto, CA, with an impressive portfolio of 31 patents. His contributions to the field of lithography are significant, particularly in developing methods and systems that enhance the efficiency and accuracy of lithographic processes, which are crucial in the semiconductor manufacturing sector.
Latest Patents: Among his latest inventions is a groundbreaking patent titled "Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process." This patent addresses the challenges posed by random stochastic phenomena in lithography, such as photon shot noise. By employing a stochastic model, this innovation allows for the optimization of light exposure and resist parameters, ultimately improving the likelihood of success in the lithographic process. Another notable patent is "Source optimization for image fidelity and throughput," which introduces a system and method for optimizing illumination sources. This invention focuses on minimizing errors in printed patterns by determining the optimum intensity for each pixel in a divided light source, showcasing Granik's commitment to pushing the boundaries of lithographic technology.
Career Highlights: Yuri Granik has made significant strides in his career, having worked with leading technology companies, including Mentor Graphics Corporation. His extensive experience in this field has led to the development of innovative solutions that address complex challenges in the lithography process.
Collaborations: Throughout his career, Granik has collaborated with notable professionals in the industry, including Juan Andres Torres Robles and Nicolas Bailey Cobb. These collaborations have enabled him to refine his innovations and contribute to the advancement of lithographic technology.
Conclusion: Yuri Granik's contributions to the field of lithography through his inventions and patents have had a lasting impact on the industry. His innovative approaches to managing stochastic variations and optimizing lithographic processes reflect his dedication to enhancing the precision and efficiency of manufacturing in the semiconductor sector. As he continues to develop new technologies, his work will undoubtedly shape the future of lithography and its applications.