The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2016

Filed:

Apr. 22, 2015
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventors:

Juan Andres Torres Robles, Wilsonville, OR (US);

Joydeep Mitra, Austin, TX (US);

Yuansheng Ma, Fremont, CA (US);

Krasnova Polina Andreevna, Moscow, RU;

Yuri Granik, Palo Alto, CA (US);

Assignee:

Mentor Graphics Corporation, Wilsonville, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5009 (2013.01); G06F 17/5072 (2013.01); G06F 2217/08 (2013.01); G06F 2217/12 (2013.01); G06F 2217/16 (2013.01);
Abstract

Aspects of the disclosed technology relate to techniques of generating guiding patterns for via-type feature groups. A guiding pattern is constructed based on seeding positions for a via-type feature group. The initial seeding positions are derived from targeted locations of via-type features in the via-type feature group. A potential energy function is then determined for the guiding pattern. Based on the potential energy function, simulated locations of the via-type features are computed. The seeding positions are compared with the targeted locations and may be adjusted based on differences between the simulated locations and the targeted locations. The above operations may be repeated until one of one or more termination conditions are met.


Find Patent Forward Citations

Loading…