Company Filing History:
Years Active: 2016-2025
Title: Yuansheng Ma: Innovator in Optical Proximity Correction and Guiding Patterns Optimization
Introduction
Yuansheng Ma is a prominent inventor based in Fremont, CA, known for his contributions to optical proximity correction and guiding patterns optimization. With a total of 4 patents, he has made significant advancements in the field of lithography technology.
Latest Patents
One of Yuansheng Ma's latest patents focuses on "Optical proximity correction based on combining inverse lithography technology with pattern classification." This technology involves receiving a layout design and performing a machine learning-based clustering process to separate layout features into groups. Preliminary corrections are determined based on inverse lithography technology and applied to generate a pre-processed layout design. An inverse lithography technology process is then performed to create a processed layout design, which can be used to manufacture masks.
Another notable patent is titled "Guiding patterns optimization for directed self-assembly." This patent describes techniques for generating guiding patterns for via-type features in a layout design. An initial guiding pattern is constructed based on target values for location and size parameters. Predicted values are extracted from the initial guiding pattern, and a modified guiding pattern is determined by adjusting parameters based on these predictions.
Career Highlights
Throughout his career, Yuansheng Ma has worked with notable companies such as Mentor Graphics Corporation and Siemens Industry Software GmbH. His experience in these organizations has contributed to his expertise in the field of optical technologies.
Collaborations
Yuansheng Ma has collaborated with talented individuals, including Junjiang Lei and Le Hong, who have contributed to his innovative projects.
Conclusion
Yuansheng Ma's work in optical proximity correction and guiding patterns optimization showcases his significant contributions to the field of lithography technology. His patents reflect a commitment to advancing technology and improving manufacturing processes.