The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Aug. 31, 2022
Siemens Industry Software Inc., Plano, TX (US);
Yuansheng Ma, Fremont, CA (US);
Le Hong, Benicia, CA (US);
Rui Wu, Clifton Park, NY (US);
Junjiang Lei, Reno, NV (US);
Siemens Industry Software Inc., Plano, TX (US);
Abstract
Various aspects of the present disclosed technology relate to techniques for inverse-lithography-technology-based optical proximity correction. A layout design is received. A machine learning-based clustering process is then performed to separate layout features in the layout design into groups of layout features. For layout features in each of the groups of layout features, preliminary corrections are determined. The determination may be based on inverse lithography technology. The preliminary corrections are applied to the layout design to generate a pre-processed layout design. An inverse lithography technology process is performed on the pre-processed layout design to generate a processed layout design. Masks can be manufactured based on the processed layout design.