Junjiang Lei

Title: Innovations of Junjiang Lei in Optical Proximity Correction

Introduction

Junjiang Lei is a notable inventor based in Reno, NV (US). He has made significant contributions to the field of optical proximity correction through his innovative patent. His work focuses on enhancing lithography technology, which is crucial in the manufacturing of integrated circuits.

Latest Patents

Junjiang Lei holds a patent titled "Optical proximity correction based on combining inverse lithography technology with pattern classification." This patent involves techniques for optical proximity correction that utilize inverse lithography technology. The process begins with receiving a layout design, followed by a machine learning-based clustering process that separates layout features into groups. Preliminary corrections are determined for each group based on inverse lithography technology. These corrections are then applied to create a pre-processed layout design, which undergoes further processing to generate a final layout design suitable for mask manufacturing.

Career Highlights

Junjiang Lei is currently employed at Siemens Industry Software GmbH, where he continues to develop and refine technologies related to optical proximity correction. His expertise in this area has positioned him as a valuable asset to his company and the broader field of semiconductor manufacturing.

Collaborations

Some of Junjiang Lei's coworkers include Yuansheng Ma and Le Hong. Their collaborative efforts contribute to the advancement of technologies in the industry.

Conclusion

Junjiang Lei's innovative work in optical proximity correction exemplifies the intersection of machine learning and lithography technology. His contributions are vital for the ongoing evolution of semiconductor manufacturing processes.