Rui Wu

Title: The Innovations of Rui Wu

Introduction

Rui Wu is an accomplished inventor based in Clifton Park, NY (US). He has made significant contributions to the field of optical proximity correction through his innovative patent. His work exemplifies the intersection of advanced technology and practical applications in the industry.

Latest Patents

Rui Wu holds a patent titled "Optical proximity correction based on combining inverse lithography technology with pattern classification." This patent focuses on techniques for optical proximity correction using inverse lithography technology. The process begins with receiving a layout design, followed by a machine learning-based clustering process that separates layout features into groups. Preliminary corrections are determined for each group based on inverse lithography technology. These corrections are then applied to generate a pre-processed layout design, which undergoes further processing to create a final layout design suitable for mask manufacturing.

Career Highlights

Rui Wu is currently employed at Siemens Industry Software GmbH, where he continues to develop and refine his innovative ideas. His expertise in optical proximity correction has positioned him as a valuable asset in the field of semiconductor manufacturing.

Collaborations

Rui Wu has collaborated with notable colleagues, including Yuansheng Ma and Le Hong. Their combined efforts contribute to the advancement of technology in their respective areas of expertise.

Conclusion

Rui Wu's contributions to optical proximity correction and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the field and showcases the importance of innovation in driving progress.