Company Filing History:
Years Active: 2023-2025
Title: Innovations by Inventor Le Hong
Introduction
Le Hong is an accomplished inventor based in Benicia, CA (US). He has made significant contributions to the field of optical proximity correction and layout pattern classification. With a total of 2 patents, his work showcases the integration of advanced technologies in the semiconductor industry.
Latest Patents
Le Hong's latest patents include innovative techniques that enhance the efficiency of optical proximity correction. One of his patents focuses on combining inverse lithography technology with pattern classification. This technology involves receiving a layout design and performing a machine learning-based clustering process to separate layout features into groups. Preliminary corrections are then determined based on inverse lithography technology, leading to a pre-processed layout design. This design undergoes further processing to generate a final layout design, which can be used to manufacture masks.
Another notable patent addresses machine learning-based clustering for curvilinear layout designs. This patent describes a method for extracting density feature vectors from layout regions using a set of rings. The clustering process separates layout features into clusters based on these density feature vectors, allowing for more precise classification of layout patterns.
Career Highlights
Le Hong is currently employed at Siemens Industry Software GmbH, where he continues to develop innovative solutions in the field of semiconductor manufacturing. His expertise in optical proximity correction and machine learning has positioned him as a key contributor to the company's advancements in technology.
Collaborations
Throughout his career, Le Hong has collaborated with talented individuals such as Lianghong Yin and Fan Jiang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Le Hong's contributions to the field of optical proximity correction and layout pattern classification demonstrate his commitment to innovation. His patents reflect a deep understanding of complex technologies and their applications in the semiconductor industry.