Company Filing History:
Years Active: 2016
Title: Innovations of Krasnova Polina Andreevna
Introduction
Krasnova Polina Andreevna is a notable inventor based in Moscow, Russia. She has made significant contributions to the field of technology, particularly in the area of directed self-assembly. Her innovative work has led to the development of a unique patent that addresses complex challenges in this domain.
Latest Patents
Krasnova holds a patent titled "Generating guiding patterns for directed self-assembly." This patent involves techniques for generating guiding patterns for via-type feature groups. The guiding pattern is constructed based on seeding positions for a via-type feature group. Initial seeding positions are derived from targeted locations of via-type features. A potential energy function is determined for the guiding pattern, and simulated locations of the via-type features are computed. The seeding positions are compared with the targeted locations and may be adjusted based on differences between the simulated and targeted locations. This iterative process continues until one or more termination conditions are met. Krasnova has 1 patent to her name.
Career Highlights
Krasnova is currently employed at Mentor Graphics Corporation, where she applies her expertise in technology and innovation. Her work at the company has allowed her to explore and develop advanced techniques in her field.
Collaborations
Krasnova has collaborated with notable colleagues, including Juan Andres Torres Robles and Joydeep Mitra. These collaborations have further enriched her work and contributed to the advancement of technology in directed self-assembly.
Conclusion
Krasnova Polina Andreevna is a pioneering inventor whose work in generating guiding patterns for directed self-assembly showcases her innovative spirit and technical expertise. Her contributions continue to influence the field and inspire future advancements.