Gladstone, OR, United States of America

Germain Louis Fenger

This inventor holds 8 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignees: Siemens Industry Software Gmbh, Mentor Graphics Corporation. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Germain Louis Fenger. Retrieved from https://idiyas.com/inventor/germain-louis-fenger

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 

% Patents Active = 87.5

 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2019-2026

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8 patents (USPTO):Explore Patents

Title: Germain Louis Fenger: A Pioneer in Lithographic Innovation

Introduction

Germain Louis Fenger is an accomplished inventor based in Gladstone, Oregon, recognized for his significant contributions to the field of lithography. With a total of five patents to his name, Fenger has demonstrated exceptional innovation and technical expertise, particularly in addressing stochastic variations in the lithographic process.

Latest Patents

Fenger's most recent patents include groundbreaking methods and systems that enhance the lithographic process. His patent titled "Method and system for calculating a printed area metric indicative of stochastic variations of the lithographic process" outlines a technique for generating printed area metrics analytically, allowing for a better understanding of random stochastic phenomena that can challenge the lithographic process. This patent focuses on the importance of the printed area metric for characterizing likelihood and variance in printing, thus providing a framework for improvement in lithography.

Another significant patent is the "Optical proximity correction model verification," which describes a computing system that determines design pattern parameters associated with integrated circuits. This system is capable of identifying discrepancies between design patterns and calibration patterns used in optical proximity correction, thereby classifying design patterns and improving accuracy in printed images on substrates.

Career Highlights

Germain Fenger has worked with prestigious companies, including Siemens Industry Software GmbH and Mentor Graphics Corporation. His experience in these organizations has equipped him with a deep understanding of the challenges and innovations in the realm of lithography, allowing him to contribute substantially to his field.

Collaborations

Throughout his career, Fenger has collaborated with notable professionals, including Gurdaman Khaira and Azat M Latypov. These collaborations have fostered an environment of innovation and have led to advancements in many of Fenger's projects.

Conclusion

Germain Louis Fenger stands out as a leading inventor in the lithographic industry. His expertise in calculating metrics related to stochastic variations and optical proximity correction has set new standards in the field. With five patents and a career marked by collaboration and innovation, Fenger continues to influence the future of lithography and inspire upcoming inventors in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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