The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Aug. 19, 2020
Mentor Graphics Corporation, Wilsonville, OR (US);
Germain Louis Fenger, Gladstone, OR (US);
Andrew Burbine, Rochester, NY (US);
Christopher Clifford, Alameda, CA (US);
Siemens Industry Software Inc., Plano, TX (US);
Abstract
This application discloses a computing system implementing an optical proximity correction model calibration tool to determine parameters for gauges describing features of an integrated circuit. The gauges include values corresponding to measurements collected for a set of the features. The optical proximity correction model calibration tool can ascertain densities of the gauges based on the measurements associated with the parameters for the gauges, and set weights for the gauges based, at least in part, on the densities. The optical proximity correction model calibration tool can calibrate an optical proximity correction (OPC) model using the weights for the gauges. The OPC model calibrated with the weights of the gauges can be utilized to predict of a printed image on a substrate described by a mask layout design corresponding to the integrated circuit.