The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Oct. 03, 2017
Mentor Graphics Corporation, Wilsonville, OR (US);
Michael Christopher Lam, Sunnyvale, CA (US);
Germain Louis Fenger, Gladstone, OR (US);
Ananthan Raghunathan, San Jose, CA (US);
Konstantinos G. Adam, Belmont, CA (US);
Christopher Heinz Clifford, Alameda, CA (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
Disclosed are techniques for processing layout designs based on dynamically-generated lithographic models. Lithographic models are determined for a plurality of regions of a reticle prior to lithographic simulation. During lithographic simulation, lithographic models for a small area within a particular region are generated based on the lithographic models for the particular region, the lithographic models for one or more neighboring regions, and location information of the small area relative to the region and to the one or more neighboring regions. The lithography models comprise illuminating and imaging system models and mask electro-magnetic field models.