Company Filing History:
7 out of 672 
1 out of 3 
2 out of 832,880 Years Active: 2009-2019
Title: Innovations of Konstantinos G Adam
Introduction
Konstantinos G Adam is a notable inventor based in Belmont, CA (US). He has made significant contributions to the field of lithography, holding a total of 10 patents. His work focuses on enhancing lithographic processes through innovative techniques and models.
Latest Patents
One of his latest patents is titled "Dynamic model generation for lithographic simulation." This patent discloses techniques for processing layout designs based on dynamically-generated lithographic models. Lithographic models are determined for various regions of a reticle prior to lithographic simulation. During the simulation, models for a small area within a specific region are generated based on the models for that region, neighboring regions, and location information. The lithography models include illuminating and imaging system models as well as mask electro-magnetic field models.
Another significant patent is "Simulation-assisted wafer rework determination." This technology relates to using hotspot simulation to make informed wafer rework decisions. Metrology data of photoresist patterns created from a layout design during a lithographic process are analyzed. Hotspots of interest are selected by comparing metrology data with simulated data associated with hotspots. The simulated data and hotspot information are generated through lithographic simulation on the layout design before the lithographic process.
Career Highlights
Throughout his career, Konstantinos has worked with various companies, including Mentor Graphics Corporation. His expertise in lithography has allowed him to contribute to advancements in the field, making him a respected figure among his peers.
Collaborations
Some of his notable coworkers include Michael Christopher Lam and Yuri Granik. Their collaborative efforts have furthered the development of innovative lithographic technologies.
Conclusion
Konstantinos G Adam's contributions to lithography through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in lithographic processes and technologies.