The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Sep. 23, 2011
James C Word, Portland, OR (US);
Konstantinos G Adam, Belmont, CA (US);
Michael Lam, Sunnyvale, CA (US);
Sergiy Komirenko, Cupertino, CA (US);
James C Word, Portland, OR (US);
Konstantinos G Adam, Belmont, CA (US);
Michael Lam, Sunnyvale, CA (US);
Sergiy Komirenko, Cupertino, CA (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
Disclosed are techniques for simulating and correcting the mask shadowing effect using the domain decomposition method (DDM). According to various implementations of the invention, DDM signals for an extreme ultraviolet (EUV) lithography mask are determined for a plurality of azimuthal angles of illumination. Base on the DDM signals, one or more layout designs for making the mask may be analyzed and/or modified.