Company Filing History:
Years Active: 2013
Title: The Innovations of Sergiy Komirenko
Introduction
Sergiy Komirenko is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of lithography. With a total of 3 patents to his name, he has developed innovative techniques that enhance the efficiency and accuracy of lithographic processes.
Latest Patents
One of his latest patents is focused on the simulation and correction of the mask shadowing effect. This invention discloses techniques for simulating and correcting the mask shadowing effect using the domain decomposition method (DDM). According to various implementations, DDM signals for an extreme ultraviolet (EUV) lithography mask are determined for a plurality of azimuthal angles of illumination. Based on these DDM signals, one or more layout designs for making the mask may be analyzed and/or modified. Another significant patent addresses the tolerable flare difference determination. This invention relates to techniques for compensating flare effects in a lithographic process for an array of identical circuits to be fabricated on a wafer. Various implementations involve selecting a reference circuit from the array and determining intolerable flare difference regions based on flare difference layers and tolerable flare difference layers. The lithographic process result for the array of identical circuits may be derived from that for the reference circuit and the intolerable flare difference regions.
Career Highlights
Sergiy Komirenko is currently employed at Mentor Graphics Corporation, where he continues to push the boundaries of innovation in lithography. His work has been instrumental in advancing the technology used in the fabrication of integrated circuits.
Collaborations
Throughout his career, Sergiy has collaborated with notable colleagues, including James C Word and Konstantinos G Adam. These collaborations have further enriched his contributions to the field.
Conclusion
Sergiy Komirenko's innovative patents and contributions to lithography demonstrate his commitment to advancing technology in this critical area. His work continues to influence the industry and pave the way for future innovations.