The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2013

Filed:

Oct. 21, 2011
Applicants:

Sergiy Komirenko, Cupertino, CA (US);

Nicolas Bailey Cobb, Sunnyvale, CA (US);

Raghu Chalasani, San Jose, CA (US);

Inventors:

Sergiy Komirenko, Cupertino, CA (US);

Nicolas Bailey Cobb, Sunnyvale, CA (US);

Raghu Chalasani, San Jose, CA (US);

Assignee:

Mentor Graphics Corporation, Wilsonville, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Aspects of the invention relate to techniques for compensating flare effects in a lithographic process for an array of identical circuits to be fabricated on a wafer. According to various implementations of the invention, a reference circuit is selected from the array of identical circuits and intolerable flare difference regions are determined based on flare difference layers and tolerable flare difference layers. The lithographic process result for the array of identical circuit may be derived from that for the reference circuit and the intolerable flare difference regions.


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