Nicolas Bailey Cobb

Title: Innovations by Nicolas Bailey Cobb in Photolithography

Introduction

Nicolas Bailey Cobb, a prolific inventor based in Sunnyvale, CA, has made significant contributions to the field of photolithography. With a remarkable portfolio of 33 patents, Cobb's work focuses on enhancing resolution techniques and modeling algorithms essential for semiconductor manufacturing.

Latest Patents

Cobb's latest innovations include two notable patents. The first, titled "Fragmentation Point and Simulation Site Adjustment for Resolution Enhancement Techniques," introduces a method where polygons representing features are fragmented into edge fragments. The process involves calculating image intensity at initial simulation sites and adjusting their positions or numbers to optimize optical proximity correction (OPC) for edge fragments. This method enables enhanced precision in feature representation, crucial for advanced lithography.

The second patent, "Lithography Model Calibration via Cache-Based Niching Genetic Algorithms," outlines a sophisticated approach to model calibration. This method involves dividing original model candidates into groups and generating child models through crossover techniques. This iterative process enhances model diversity while controlling the number of candidates, thereby improving the efficiency of lithography modeling.

Career Highlights

Nicolas Cobb has held positions in notable companies, including his tenure at Mentor Graphics Corporation, where he further developed his expertise in semiconductor technology. His inventions not only demonstrate technical prowess but also reflect his commitment to advancing the field of photolithography.

Collaborations

Throughout his career, Cobb has collaborated with esteemed professionals, including Emile Y. Sahouria and James C. Word. These partnerships have enriched his work, enabling impactful innovations in the industry.

Conclusion

Nicolas Bailey Cobb’s contributions to photolithography have established him as a leading inventor in the field. His patents highlight his ingenuity and dedication to improving manufacturing techniques, ultimately paving the way for more efficient semiconductor production. Cobb's continued work promises to influence the future of lithography and related technologies.