The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2007

Filed:

Dec. 08, 2003
Applicants:

Nicolas B. Cobb, San Jose, CA (US);

Laurence W. Grodd, Portland, OR (US);

George P. Lippincott, Lake Oswego, OR (US);

Emile Sahouria, San Jose, CA (US);

Inventors:

Nicolas B. Cobb, San Jose, CA (US);

Laurence W. Grodd, Portland, OR (US);

George P. Lippincott, Lake Oswego, OR (US);

Emile Sahouria, San Jose, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.


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