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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Emile Y Sahouria

This inventor holds 25 USPTO granted patents and 4 published patent applications and 2 EPO patents, primarily in Mask Design Technology. Top assignees: Mentor Graphics Corporation, Other. Active years: 2002-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emile Y Sahouria. Retrieved from https://idiyas.com/inventor/emile-y-sahouria

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 100.0


Average Co-Inventor Count = 1.9

ph-index = 11

Forward Citations = 907(Granted Patents)


Location History:

  • Sunyvale, CA (US) (2012)
  • San Jose, CA (US) (2002 - 2016)
  • Sunnyvale, CA (US) (2010 - 2018)

Company Filing History:

goldMedal16 out of 672 
 
Mentor Graphics Corporation
 patents
silverMedal9 out of 834,570 
Other
 patents

Years Active: 2002-2018

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Areas of Expertise:
Mask Creation
Optical Proximity Correction
Integrated Circuit Layout
Hierarchical Management
Data Preparation
Resolution Enhancement
Layout Parsing
Manufacturability Tool
Model Calibration
Data Flow Branching
Etch Effect
Exposure Effect
25 patents (USPTO):Explore Patents
1. 9996651 - Mask creation with hierarchy management using cover cells (2018-06-12),
2. 9448481 - Generalization of shot definitions for mask and wafer writing tools (2016-09-20),
3. 9292643 - Mask creation with hierarchy management using cover cells (2016-03-22),
4. 9134616 - Generalization of shot definitions for mask and wafer writing tools (2015-09-15),
5. 8930856 - Mask rule checking based on curvature (2015-01-06),
6. 8826196 - Integration of optical proximity correction and mask data preparation (2014-09-02),
7. 8713483 - IC layout parsing for multiple masks (2014-04-29),
8. 8640059 - Forming separation directives using a printing feasibility analysis (2014-01-28),
9. 8635562 - Data flow branching in mask data preparation (2014-01-21),
10. 8560981 - Segmenting integrated circuit layout design files using speculative parsing (2013-10-15),
11. 8516401 - Mask model calibration technologies involving etch effect and exposure effect (2013-08-20),
12. 8234599 - Use of graphs to decompose layout design data (2012-07-31),
13. 7802226 - Data preparation for multiple mask printing (2010-09-21),
14. 7716624 - Mask creation with hierarchy management using cover cells (2010-05-11),
15. 7367009 - Convergence technique for model-based optical and process correction (2008-04-29),

Title: Emile Y Sahouria: Innovator in IC Design and Mask Writing Technologies

Introduction

Emile Y Sahouria, based in Sunnyvale, CA, is a prominent inventor known for his significant contributions to the field of integrated circuit (IC) design and mask writing technologies. With an impressive portfolio of 25 patents, Sahouria has made notable advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among Sahouria's latest patents is the innovative method for mask creation with hierarchy management using cover cells. This invention facilitates the translation of a hierarchical IC layout file into a format suitable for mask writers that operate under limited hierarchy constraints. The method involves designating cover cells and redefining the hierarchical file to streamline the writing process by flattening non-designated cover cells and other geometric data into the designated cover cells.

Another significant patent addresses the generalization of shot definitions for mask and wafer writing tools. This invention focuses on techniques aimed at minimizing the number of shots required by radiation beam writing tools for pattern application on substrates. By employing one or more apertures, this technology optimizes the writing of patterns using various image formats, ultimately reducing both the write time and complexity involved in the writing process.

Career Highlights

Emile Y Sahouria has held key roles in industry-leading companies, including Mentor Graphics Corporation, where his expertise has driven numerous projects and innovations in IC design and manufacturing. His extensive knowledge and experience have made him a valuable asset to the organizations he has contributed to.

Collaborations

Throughout his career, Sahouria has collaborated with notable professionals such as Nicolas Bailey Cobb and Laurence W Grodd. These partnerships have undoubtedly enriched his work and have contributed to the advancements in the technologies he has developed.

Conclusion

With a robust collection of patents and a career marked by significant achievements, Emile Y Sahouria stands out as a leading inventor in the realm of integrated circuit design and mask writing. His work continues to influence the semiconductor industry, driving innovation and enhancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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