The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Jun. 05, 2007
Alexander Tritchkov, Hillsboro, OR (US);
Emile Y. Sahouria, Sunnyvale, CA (US);
Le Hong, Wilsonville, OR (US);
Alexander Tritchkov, Hillsboro, OR (US);
Emile Y. Sahouria, Sunnyvale, CA (US);
Le Hong, Wilsonville, OR (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.