Location History:
- West Linn, OR (US) (2013 - 2014)
- Wilsonville, OR (US) (2014)
- Vacaville, CA (US) (2017 - 2019)
Company Filing History:
Years Active: 2013-2019
Title: Le Hong: Innovator in Directed Self-Assembly Technologies
Introduction
Le Hong is a prominent inventor based in West Linn, OR (US). He has made significant contributions to the field of directed self-assembly technologies, holding a total of 6 patents. His work focuses on optimizing guiding patterns and improving optical proximity correction techniques.
Latest Patents
One of Le Hong's latest patents is titled "Guiding patterns optimization for directed self-assembly." This patent involves techniques for generating guiding patterns for via-type features in layout designs. The process begins with constructing an initial guiding pattern characterized by various parameters based on target values for location and size. Predicted values are then extracted from this initial pattern, allowing for iterative adjustments to optimize the guiding pattern.
Another notable patent is "Optical proximity correction for directed-self-assembly guiding patterns." This invention addresses the generation of an initial mask pattern for photomask fabrication through conventional optical proximity correction iterations. It involves determining predicted print errors for via-type features and adjusting the initial mask pattern to create a new, optimized mask pattern.
Career Highlights
Le Hong is currently employed at Mentor Graphics Corporation, where he continues to innovate in the field of electronic design automation. His work has been instrumental in advancing technologies that enhance the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Le Hong collaborates with talented individuals such as Junjiang Lei and Yuansheng Ma, contributing to a dynamic and innovative work environment.
Conclusion
Le Hong's contributions to directed self-assembly technologies and his innovative patents reflect his expertise and commitment to advancing the field. His work at Mentor Graphics Corporation continues to influence the future of semiconductor manufacturing.