The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Sep. 08, 2015
Applicant:
Mentor Graphics Corporation, Wilsonville, OR (US);
Inventors:
Emile Y. Sahouria, Sunnyvale, CA (US);
Steffen Schulze, Sherwood, OR (US);
Assignee:
Mentor Graphics Corporation, Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/76 (2012.01); G03F 1/50 (2012.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01J 37/317 (2006.01); H01L 21/26 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2063 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 7/2045 (2013.01); G03F 7/70466 (2013.01); H01J 37/3174 (2013.01); H01L 21/0274 (2013.01); H01L 21/26 (2013.01);
Abstract
Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.