The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Jan. 08, 2007
Jea-woo Park, Wilsonville, OR (US);
Emile Y. Sahouria, Sunnyvale, CA (US);
Jea-Woo Park, Wilsonville, OR (US);
Emile Y. Sahouria, Sunnyvale, CA (US);
Abstract
A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or adjacent features that are within a predetermined distance of each other and are assigned to the same group or data layer are identified. Cutting boxes are added to a feature to divide a feature into two or more smaller features. A coloring algorithm is re-applied to the layout including the cutting boxes to assign the features into different groups or data layers. Data in each group or data layer is used to define a mask to print the target feature pattern.