The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Aug. 19, 2010
Applicants:
Christopher E Reid, Tigard, OR (US);
George P Lippincott, Lake Oswego, OR (US);
Sergiy M Komirenko, Cupertino, CA (US);
Inventors:
Christopher E Reid, Tigard, OR (US);
George P Lippincott, Lake Oswego, OR (US);
Sergiy M Komirenko, Cupertino, CA (US);
Assignee:
Mentor Graphics Corporation, Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2006.01); G03F 1/00 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Layout design data are decomposed for double dipole lithography based on partial intensity distribution information. The partial intensity distribution information is generated by performing optical simulations on the layout design data. The layout decomposition may further be adjusted during an optical proximity correction process. The adjustment may utilize the partial intensity distribution information.