The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Aug. 31, 2022
Siemens Industry Software Inc., Plano, TX (US);
Germain Louis Fenger, Gladstone, OR (US);
Mark Pereira, Bengaluru, IN;
Bhamidipati Venkata Rama Samir, Bengaluru, IN;
Sandip Halder, Bierbeek, BE;
Bappaditya Dey, Heverlee, BE;
Hsin-Wei Wu, Heverlee, BE;
Kiarash Ahi, San Jose, CA (US);
Siemens Industry Software Inc., Plano, TX (US);
Abstract
This application discloses a computing system to obtain a wafer image of an electronic device having physical structures manufactured using one or more lithographic masks associated with a layout design describing the electronic design. The computing system can implement an unsupervised deep learning algorithm to process the wafer image to remove at least some noise from the wafer image, which generates a denoised wafer image. The computing system can extract contours corresponding to the physical structures of the electronic device from the denoised wafer image of the electronic device without use of the layout design or a mask design. The computing system can calibrate the layout design or the mask design describing the one or more lithographic masks based, at least in part, on the contours extracted from the denoised wafer image.