Hsin-Wei Wu

Title: Hsin-Wei Wu: Innovator in Wafer Image Defect Detection

Introduction

Hsin-Wei Wu is a notable inventor based in Heverlee, Belgium. He has made significant contributions to the field of electronic device manufacturing through his innovative patent. His work focuses on improving the efficiency and accuracy of wafer image defect detection.

Latest Patents

Hsin-Wei Wu holds a patent for a system titled "Wafer image defect detection and characterization for manufacturing process calibration." This computing system implements a raw data filtering tool that aggregates multiple wafer images depicting a portion of an electronic device into a reference image. It detects defects in the wafer images by comparing them to the reference image and generates a gauge file that includes a set of wafer images selected based on the detection of defects. The tool iteratively builds defect maps that characterize the detected defects in terms of size and location. Additionally, it provides feedback to foundries regarding wafer images that were excluded based on defect detection.

Career Highlights

Hsin-Wei Wu is currently employed at Siemens Industry Software GmbH, where he applies his expertise in wafer image analysis and defect detection. His innovative approach has contributed to advancements in manufacturing processes within the electronics industry.

Collaborations

Hsin-Wei has collaborated with notable colleagues such as Kiarash Ahi and Germain Louis Fenger, enhancing the collective knowledge and innovation within their field.

Conclusion

Hsin-Wei Wu's contributions to wafer image defect detection exemplify the importance of innovation in manufacturing processes. His patent reflects a commitment to improving electronic device production through advanced technology.