Michael Patra

This inventor holds 71 USPTO granted patents and 8 published patent applications and 23 EPO patents, primarily in EUV Lithography (CPC class G03F). Top assignees: Carl Zeiss Smt Gmbh, Tooz Technologies Gmbh. Active years: 2012-2026.

USPTO Granted Patents = 71 (Patent Applications = 8)

% Patents Active = 71.8

EPO Patents = 23 (Patent Applications = 29)

Average Co-Inventor Count = 1.8

ph-index = 5

Forward Citations = 108(Granted Patents)

Forward Citations (Not Self Cited) = 85(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

Tooz Technologies Gmbh

patents

Years Active: 2012-2026

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Areas of Expertise:

EUV Lithography

Illumination Optics

Microlithography

Optical Systems

Projection Exposure

Digital Micromirror Device

Facet Mirror

Optical Components

Measurement Illumination

Projection Apparatus

Light Source

71 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12585193 - Optical system for a lithographic projection exposure apparatus (2026-03-24),

2. 12516963 - Method for determining a position of a mirror (2026-01-06),

3. 12339589 - Digital micromirror device for an illumination optical component of a projection exposure system (2025-06-24),

4. 11720028 - Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography (2023-08-08),

5. 11350513 - Stop for arrangement in a constriction of an EUV illumination beam (2022-05-31),

6. 11137688 - Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask (2021-10-05),

7. 10928734 - Optical assembly for guiding an output beam of a free electron laser (2021-02-23),

8. 10928733 - Illumination optic for projection lithography (2021-02-23),

9. 10871717 - Optical system for a projection exposure apparatus (2020-12-22),

10. 10802403 - Method for the microlithographic production of microstructured components (2020-10-13),

11. 10678144 - Projection exposure method and projection exposure apparatus for microlithography (2020-06-09),

12. 10514611 - Projection exposure method and projection exposure apparatus for microlithography (2019-12-24),

13. 10310381 - Illumination system for EUV projection lithography (2019-06-04),

14. 10288894 - Optical component for use in a radiation source module of a projection exposure system (2019-05-14),

15. 10216091 - Facet mirror for an illumination optical unit for projection lithography (2019-02-26),

Title: The Innovative Journey of Michael Patra

Introduction: Michael Patra, a visionary inventor hailing from Oberkochen, Germany, has made significant contributions to the field of technology with his groundbreaking inventions.

Latest Patents: Michael Patra holds several patents in the areas of optical technology and precision engineering, with his most recent patent focusing on a revolutionary lens design for high-resolution imaging systems.

Career Highlights: Throughout his illustrious career, Michael Patra has worked for renowned technology companies, leading research teams and spearheading projects that have pushed the boundaries of innovation in the optics industry. His expertise in developing cutting-edge solutions has earned him recognition as a pioneer in his field.

Collaborations: Michael Patra has collaborated with top research institutions and universities around the world, fostering a culture of innovation and knowledge sharing. His collaborative efforts have resulted in the development of state-of-the-art optical devices that have revolutionized various industries.

Conclusion: In conclusion, Michael Patra's relentless pursuit of innovation and his passion for pushing the limits of technology have solidified his reputation as a trailblazer in the field of optics. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements.