The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Apr. 16, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Michael Patra, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for the microlithographic production of microstructured components, includes: providing a wafer, to which a photoresist is applied at least partly; providing a mask having structures to be imaged; providing a projection exposure apparatus having an illumination unit and a projection lens; exposing the photoresist by projecting at least one part of the mask onto a region of the photoresist with the aid of the projection exposure apparatus; and ascertaining a deviation between a structure property of the structures produced on the exposed wafer from a predefined desired structure property. Ascertaining includes: determining at least one property of a light field used for exposing the photoresist applied to the wafer. The method further includes aftertreating the wafer on the basis of the ascertained deviation, and chemically developing the after treated wafer.