The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
Feb. 17, 2017
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Markus Deguenther, Aalen, DE;
Michael Patra, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/08 (2006.01); G02B 5/09 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70075 (2013.01); G02B 5/0891 (2013.01); G02B 5/09 (2013.01); G03F 7/702 (2013.01); G03F 7/70033 (2013.01); G03F 7/70116 (2013.01); G21K 1/067 (2013.01);
Abstract
A facet mirror for an illumination optical unit for projection lithography has a plurality of used facets, which in each case reflect an illumination light partial beam. The facet mirror has at least one change subunit having a plurality of change facets arranged jointly on a facet carrier, which change facets can be positioned alternatively at the used location of exactly one used facet. This results in a facet mirror with which different illumination geometries or illumination settings can be set operationally reliably and stably.