The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Feb. 28, 2024
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Ralf Wichard, Oberkochen, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70916 (2013.01); G03F 7/70033 (2013.01); G03F 7/70233 (2013.01); G03F 7/70825 (2013.01);
Abstract
An EUV lithography system () including: a housing (), at least one reflective optical element (M, M) disposed within an interior () of the housing (), and at least one gas-binding component (-) having a gas-binding material for binding gaseous contaminating substances () present in the interior (). The gas-binding component is formed as a foil (-) and a coating () containing the gas-binding material is applied on at least one side () of the foil (-).
Quick Actions:
Wichard, Ralf. (2026). Euv lithography system comprising a gas-binding component in the form of a foil (U.S. Patent No. 12775221). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12775221
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile