This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Ralf Wichard and an Innovation in EUV Lithography
Introduction
Ralf Wichard is an inventor associated with Oberkochen, Germany, and Carl Zeiss SMT GmbH. His patent work addresses contamination control in extreme ultraviolet (EUV) lithography systems, where clean optical components are important to system performance.
Latest Patents
The available information lists 1 patent for Ralf Wichard: “EUV Lithography System Comprising a Gas-Binding Component in the Form of a Foil.” The invention describes an EUV lithography system with a housing and at least one reflective optical element inside it. A foil serves as a gas-binding component, with a coating containing gas-binding material applied to at least one side. The material is designed to bind gaseous contaminants present within the housing.
Career Highlights
Wichard’s listed patent connects his inventive work with Carl Zeiss SMT GmbH, a company involved in optical technologies. The patent focuses on a component intended to address gaseous contamination within an EUV lithography system.
Collaborations
The available details associate Wichard’s patent with Carl Zeiss SMT GmbH. No additional collaborators are identified in the information provided.
Conclusion
Ralf Wichard’s listed invention applies a coated foil as a gas-binding component in an EUV lithography system, highlighting a practical approach to managing contaminants near sensitive optical elements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile