Company Filing History:
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Title: Anja Schauer: Innovator in Photolithographic Mask Technology
Introduction
Anja Schauer is a notable inventor based in Aalen, Germany. She has made significant contributions to the field of photolithography, particularly through her innovative methods and apparatuses. Her work has implications for the semiconductor industry and beyond.
Latest Patents
Anja Schauer holds one patent titled "Method and apparatus for performing an aerial image simulation of a photolithographic mask." This invention involves a method for simulating aerial images of photolithographic masks. The process includes modifying the optical radiation distribution at a patterned surface of the mask based on a specific arrangement of pixels. This modification is crucial for accurately performing the aerial image simulation.
Career Highlights
Throughout her career, Anja has worked with prominent companies in the industry, including Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. Her experience in these organizations has allowed her to develop and refine her innovative techniques in photolithography.
Collaborations
Anja has collaborated with notable professionals in her field, including Vladimir Dmitriev and Joachim Welte. These collaborations have contributed to her success and the advancement of her inventions.
Conclusion
Anja Schauer is a pioneering inventor whose work in photolithographic mask technology has made a significant impact on the industry. Her innovative methods continue to influence advancements in photolithography and related fields.