Elmar Platzgummer

This inventor holds 55 USPTO granted patents and 7 published patent applications and 33 EPO patents, primarily in Multi-Beam Writing (CPC class H01J). Top assignees: Ims Nanofabrication Ag, Ims Nanofabrication Gmbh, Carl Zeiss Sms Ltd.. Active years: 2004-2026.

USPTO Granted Patents = 55 (Patent Applications = 7)

% Patents Active = 87.3

EPO Patents = 33 (Patent Applications = 42)

Average Co-Inventor Count = 1.8

ph-index = 22

Forward Citations = 2,626(Granted Patents)

Forward Citations (Not Self Cited) = 1,948(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

28 out of 29

Ims Nanofabrication Ag

patents

17 out of 26

Ims Nanofabrication Gmbh

Ims-Ionen Mikrofabrikations Systeme Gmbh

patents

5. 1 out of 10

Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.b.h.

patents

6. 1 out of 1

Ims Nanofabrications Ag

patent

7. 1 out of 1

Ims-Innenmikrofabrikations Systeme Gmbh

patent

8. 1 out of 1

Ims-Ionen Mikrofabrikationas Systeme

patent

9. 1 out of 2

Institut Fur Mikroelektronik

patents

where one patent can have more than one assignee

Years Active: 2004-2026

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Areas of Expertise:

Multi-Beam Writing

Pattern Definition

Dose Compensation

Charged-Particle Source

Beam Pattern Device

Exposure Apparatus

Particle-Optical System

Electrostatic Zone Plate

Deflector Array

Image Distortion

Maskless Exposure

Feature Reshaping

55 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12706270 - Adjustable permanent magnetic lens having thermal control device (2026-08-11),

2. 12671054 - Adjustable permanent magnetic lens having shunting device (2026-06-30),

3. 12638783 - Correction of thermal expansion in a lithographic device (2026-05-26),

4. 12614695 - Multi-beam pattern definition device (2026-04-28),

5. 12154756 - Beam pattern device having beam absorber structure (2024-11-26),

6. 12040157 - Pattern data processing for programmable direct-write apparatus (2024-07-16),

7. 11569064 - Method for irradiating a target using restricted placement grids (2023-01-31),

8. 10840054 - Charged-particle source and method for cleaning a charged-particle source using back-sputtering (2020-11-17),

9. 10651010 - Non-linear dose- and blur-dependent edge placement correction (2020-05-12),

10. 10522329 - Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus (2019-12-31),

11. 10410831 - Multi-beam writing using inclined exposure stripes (2019-09-10),

12. 10325757 - Advanced dose-level quantization of multibeam-writers (2019-06-18),

13. 10325756 - Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer (2019-06-18),

14. 9799487 - Bi-directional double-pass multi-beam writing (2017-10-24),

15. 9653263 - Multi-beam writing of pattern areas of relaxed critical dimension (2017-05-16),

Title: The Innovative Mind of Elmar Platzgummer

Introduction: Elmar Platzgummer is a visionary inventor hailing from Vienna, Austria, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Elmar Platzgummer holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of what is possible in the modern world.

Career Highlights: With a career spanning over two decades, Elmar Platzgummer has worked with leading tech companies and research institutions, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Elmar Platzgummer has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and excellence in all his endeavors.

Conclusion: Elmar Platzgummer's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventions. His work continues to inspire and shape the landscape of technological advancements worldwide.