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Vienna, Austria

Elmar Platzgummer

USPTO Granted Patents = 51 (Patent Applications = 9)

EPO Patents = 33 (Patent Applications = 38)

Average Co-Inventor Count = 1.8

ph-index = 22

Forward Citations = 2,511(Granted Patents)

Forward Citations (Not Self Cited) = 1,948(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

Ims Nanofabrication Ag

Ims Nanofabrication Gmbh

Carl Zeiss Sms Ltd.

Ims-ionen Mikrofabrikations Systeme Gmbh

Institut Fur Mikroelektronik

Ims-innenmikrofabrikations Systeme Gmbh

Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.b.h.

Ims-ionen Mikrofabrikationas Systeme

Ims Nanofabrications Ag

where one patent can have more than one assignee

Years Active: 2004-2024

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Areas of Expertise:

Beam Pattern Device

Multi-Beam Writing

Charged-Particle Source

Pattern Data Processing

Dose-Related Feature Reshaping

Particle-Optical System

Maskless Particle-Beam Exposure

High-Voltage Insulation Device

Multi-Beam Deflector Array

Ion Irradiation

Advanced Pattern Definition

Customizing Particle-Beam Writer

51 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12154756 - Beam pattern device having beam absorber structure (2024-11-26),

2. 12040157 - Pattern data processing for programmable direct-write apparatus (2024-07-16),

3. 11569064 - Method for irradiating a target using restricted placement grids (2023-01-31),

4. 10840054 - Charged-particle source and method for cleaning a charged-particle source using back-sputtering (2020-11-17),

5. 10651010 - Non-linear dose- and blur-dependent edge placement correction (2020-05-12),

6. 10522329 - Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus (2019-12-31),

7. 10410831 - Multi-beam writing using inclined exposure stripes (2019-09-10),

8. 10325757 - Advanced dose-level quantization of multibeam-writers (2019-06-18),

9. 10325756 - Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer (2019-06-18),

10. 9799487 - Bi-directional double-pass multi-beam writing (2017-10-24),

11. 9653263 - Multi-beam writing of pattern areas of relaxed critical dimension (2017-05-16),

12. 9568907 - Correction of short-range dislocations in a multi-beam writer (2017-02-14),

13. 9520268 - Compensation of imaging deviations in a particle-beam writer using a convolution kernel (2016-12-13),

14. 9495499 - Compensation of dose inhomogeneity using overlapping exposure spots (2016-11-15),

15. 9443699 - Multi-beam tool for cutting patterns (2016-09-13),

Title: The Innovative Mind of Elmar Platzgummer

Introduction: Elmar Platzgummer is a visionary inventor hailing from Vienna, Austria, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Elmar Platzgummer holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of what is possible in the modern world.

Career Highlights: With a career spanning over two decades, Elmar Platzgummer has worked with leading tech companies and research institutions, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Elmar Platzgummer has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and excellence in all his endeavors.

Conclusion: Elmar Platzgummer's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the world of inventions. His work continues to inspire and shape the landscape of technological advancements worldwide.

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