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Vienna, Austria

Ims Nanofabrication Gmbh

USPTO Granted Patents = 20

EPO Patents = 17

Trademarks = 2

Forward Citations = 1,796

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24 inventors (with patents filed for the assignee):

Elmar Platzgummer (13 out of 51 patents)

Christoph Spengler (10 out of 11 patents)

Wolf Naetar (5 out of 5 patents)

4. Gerhard Stengl (5 out of 37 patents)

5. Herbert Buschbeck (4 out of 8 patents)

6. Gertraud Lammer (4 out of 6 patents)

7. Alfred Chalupka (3 out of 17 patents)

8. Mattia Capriotti (2 out of 2 patents)

9. Robert Nowak (2 out of 5 patents)

10. Johannes Leitner (2 out of 2 patents)

11. Stefan Eder-Kapl (2 out of 2 patents)

12. Gottfried Hochleitner (1 out of 4 patents)

13. Hanns Peter Petsch (1 out of 1 patent)

14. Hans Loeschner (1 out of 6 patents)

15. Stefan Cernusca (1 out of 5 patents)

20 patents: Sort by Forward Citations

1. 12500060 - Electromagnetic lens (2025-12-16),

2. 12481214 - Correction of blur variation in a multi-beam writer (2025-11-25),

3. 12154756 - Beam pattern device having beam absorber structure (2024-11-26),

4. 12040157 - Pattern data processing for programmable direct-write apparatus (2024-07-16),

5. 11735391 - Charged-particle source (2023-08-22),

6. 11569064 - Method for irradiating a target using restricted placement grids (2023-01-31),

7. 11099482 - Adapting the duration of exposure slots in multi-beam writers (2021-08-24),

8. 10840054 - Charged-particle source and method for cleaning a charged-particle source using back-sputtering (2020-11-17),

9. 10651010 - Non-linear dose- and blur-dependent edge placement correction (2020-05-12),

10. 10522329 - Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus (2019-12-31),

11. 10410831 - Multi-beam writing using inclined exposure stripes (2019-09-10),

12. 10325757 - Advanced dose-level quantization of multibeam-writers (2019-06-18),

13. 10325756 - Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer (2019-06-18),

14. 7436120 - Compensation of magnetic fields (2008-10-14),

15. 7388217 - Particle-optical projection system (2008-06-17),

IMS Nanofabrication GmbH is a leading semiconductor equipment manufacturer specializing in nanolithography solutions. Their innovative technologies and solutions enable the precise fabrication of nanostructures for a wide range of applications in industries such as electronics, photonics, and life sciences.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 20 2026

20 Patents

#41 in Vienna

#178 in Austria

#30,410 in the World

Vienna, Austria

Ims Nanofabrication Gmbh

Forward Citations = 1,796

24 inventors:

Elmar Platzgummer (13 out of 51 patents)

Christoph Spengler (10 out of 11 patents)

Wolf Naetar (5 out of 5 patents)

4. Gerhard Stengl (5 out of 37 patents)

5. Herbert Buschbeck (4 out of 8 patents)

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