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Vienna, Austria

Ims Nanofabrication Gmbh

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USPTO Granted Patents = 26

EPO Patents = 18

Trademarks = 2

Forward Citations = 1,848

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26 inventors (with patents filed for the assignee):

Elmar Platzgummer (17 out of 55 patents)

Christoph Spengler (16 out of 17 patents)

Wolf Naetar (7 out of 7 patents)

4. Gerhard Stengl (5 out of 37 patents)

5. Herbert Buschbeck (4 out of 8 patents)

6. Gertraud Lammer (4 out of 6 patents)

7. Johannes Leitner (4 out of 4 patents)

8. Alfred Chalupka (3 out of 17 patents)

9. Dietmar Puchberger (3 out of 3 patents)

10. Stefan Eder-Kapl (3 out of 3 patents)

11. Matthias Liertzer (3 out of 3 patents)

12. Mattia Capriotti (2 out of 2 patents)

13. Robert Nowak (2 out of 5 patents)

14. Patrick Mayrhofer (2 out of 2 patents)

15. Michael Haberler (2 out of 2 patents)

Core Competencies:

Multi-Beam Writers

Charged-Particle Source

Pattern Definition

Electromagnetic Lens

Thermal Control

Image Distortion

Blur Variation

Exposure Patterns

Magnetic Fields

Projection System

Dose-Related Features

Maskless Exposure

26 patents: Sort by Forward Citations

1. 12738453 - Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus (2026-09-15),

2. 12706270 - Adjustable permanent magnetic lens having thermal control device (2026-08-11),

3. 12695055 - Optimizing image distortion in a multi beam charged particle processing apparatus (2026-07-28),

4. 12671054 - Adjustable permanent magnetic lens having shunting device (2026-06-30),

5. 12638783 - Correction of thermal expansion in a lithographic device (2026-05-26),

6. 12614695 - Multi-beam pattern definition device (2026-04-28),

7. 12500060 - Electromagnetic lens (2025-12-16),

8. 12481214 - Correction of blur variation in a multi-beam writer (2025-11-25),

9. 12154756 - Beam pattern device having beam absorber structure (2024-11-26),

10. 12040157 - Pattern data processing for programmable direct-write apparatus (2024-07-16),

11. 11735391 - Charged-particle source (2023-08-22),

12. 11569064 - Method for irradiating a target using restricted placement grids (2023-01-31),

13. 11099482 - Adapting the duration of exposure slots in multi-beam writers (2021-08-24),

14. 10840054 - Charged-particle source and method for cleaning a charged-particle source using back-sputtering (2020-11-17),

15. 10651010 - Non-linear dose- and blur-dependent edge placement correction (2020-05-12),

Company Overview

Ims Nanofabrication GmbH, based in Vienna, specializes in advanced nanofabrication technologies, focusing on the development of innovative solutions for the semiconductor industry. The company is known for its expertise in electron beam lithography, which enables the production of high-precision micro and nanoscale structures. By leveraging cutting-edge research and technology, Ims Nanofabrication plays a crucial role in enhancing the capabilities of various applications, including electronics and photonics, contributing to the advancement of modern technology.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Nov 10 2026

26 Patents

#36 in Vienna

#140 in Austria

#24,889 in the World

Vienna, Austria

Ims Nanofabrication Gmbh

Forward Citations = 1,848

26 inventors:

Elmar Platzgummer (17 out of 55 patents)

Christoph Spengler (16 out of 17 patents)

Wolf Naetar (7 out of 7 patents)

4. Gerhard Stengl (5 out of 37 patents)

5. Herbert Buschbeck (4 out of 8 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Ims Nanofabrication Gmbh. Retrieved from https://idiyas.com/company/ims-nanofabrication

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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