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For the Inventor, By the Inventor

Vienna, Austria

Ims Nanofabrication Gmbh


USPTO Granted Patents = 26


Trademarks = 2

Forward Citations = 1,838

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26 inventors (with patents filed for the assignee):

goldMedal Elmar Platzgummer (17 out of 55 patents)

silverMedal Christoph Spengler (16 out of 17 patents)

bronzeMedal Wolf Naetar (7 out of 7 patents)

4.  Gerhard Stengl (5 out of 37 patents)

5.  Herbert Buschbeck (4 out of 8 patents)

6.  Gertraud Lammer (4 out of 6 patents)

7.  Johannes Leitner (4 out of 4 patents)

8.  Alfred Chalupka (3 out of 17 patents)

9.  Dietmar Puchberger (3 out of 3 patents)

10.  Stefan Eder-Kapl (3 out of 3 patents)

11.  Matthias Liertzer (3 out of 3 patents)

12.  Mattia Capriotti (2 out of 2 patents)

13.  Robert Nowak (2 out of 5 patents)

14.  Patrick Mayrhofer (2 out of 2 patents)

15.  Michael Haberler (2 out of 2 patents)


Core Competencies:
Multi-Beam Writers
Charged-Particle Source
Pattern Definition
Electromagnetic Lens
Thermal Control
Image Distortion
Blur Variation
Exposure Patterns
Magnetic Fields
Projection System
Dose-Related Features
Maskless Exposure

26 patents:

1. 12738453 - Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus (2026-09-15),
2. 12706270 - Adjustable permanent magnetic lens having thermal control device (2026-08-11),
3. 12695055 - Optimizing image distortion in a multi beam charged particle processing apparatus (2026-07-28),
4. 12671054 - Adjustable permanent magnetic lens having shunting device (2026-06-30),
5. 12638783 - Correction of thermal expansion in a lithographic device (2026-05-26),
6. 12614695 - Multi-beam pattern definition device (2026-04-28),
7. 12500060 - Electromagnetic lens (2025-12-16),
8. 12481214 - Correction of blur variation in a multi-beam writer (2025-11-25),
9. 12154756 - Beam pattern device having beam absorber structure (2024-11-26),
10. 12040157 - Pattern data processing for programmable direct-write apparatus (2024-07-16),
11. 11735391 - Charged-particle source (2023-08-22),
12. 11569064 - Method for irradiating a target using restricted placement grids (2023-01-31),
13. 11099482 - Adapting the duration of exposure slots in multi-beam writers (2021-08-24),
14. 10840054 - Charged-particle source and method for cleaning a charged-particle source using back-sputtering (2020-11-17),
15. 10651010 - Non-linear dose- and blur-dependent edge placement correction (2020-05-12),
Ims Nanofabrication GmbH, based in Vienna, specializes in advanced nanofabrication technologies, focusing on the development of innovative solutions for the semiconductor industry. The company is known for its expertise in electron beam lithography, which enables the production of high-precision micro and nanoscale structures. By leveraging cutting-edge research and technology, Ims Nanofabrication plays a crucial role in enhancing the capabilities of various applications, including electronics and photonics, contributing to the advancement of modern technology.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Oct 6 2026

Ims Nanofabrication Gmbh
26 Patents

#36 in Vienna

#140 in Austria

#24,781 in the World

Vienna, AT
Vienna, Austria

Ims Nanofabrication Gmbh

Forward Citations = 1,838

26 inventors:

goldMedal Elmar Platzgummer (17 out of 55 patents)

silverMedal Christoph Spengler (16 out of 17 patents)

bronzeMedal Wolf Naetar (7 out of 7 patents)

4.  Gerhard Stengl (5 out of 37 patents)

5.  Herbert Buschbeck (4 out of 8 patents)

Please report any incorrect information to [email protected]
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