Company Filing History:
Years Active: 2019-2025
Title: Innovations of Wolf Naetar
Introduction
Wolf Naetar is a prominent inventor based in Vienna, Austria. He has made significant contributions to the field of charged-particle lithography, holding a total of four patents. His work focuses on methods that enhance the precision and efficiency of particle beam exposure techniques.
Latest Patents
One of Naetar's latest patents is titled "Method for irradiating a target using restricted placement grids." This innovative method involves irradiating a target with a beam of energetic electrically charged particles. The target includes an exposure region where the beam performs exposure by employing multiple exposure positions, each representing a location for uniform exposure spots. These spots cover at least one pattern pixel of the desired pattern, with exposure positions organized within separate cluster areas defined at fixed locations on the target.
Another notable patent is "Adapting the duration of exposure slots in multi-beam writers." This patent addresses the fluctuations of the particle beam during the writing of a desired pattern. The method involves adjusting the duration of exposure slots to ensure that each pixel is effectively exposed through overlapping aperture images, resulting in a precise and controlled exposure time.
Career Highlights
Wolf Naetar is currently associated with Ims Nanofabrication GmbH, where he continues to develop cutting-edge technologies in nanofabrication. His expertise in charged-particle lithography has positioned him as a key figure in advancing this field.
Collaborations
Naetar has collaborated with notable colleagues, including Christoph Spengler and Elmar Platzgummer. Their combined efforts contribute to the innovative projects at Ims Nanofabrication GmbH.
Conclusion
Wolf Naetar's contributions to the field of charged-particle lithography through his patents and work at Ims Nanofabrication GmbH highlight his role as a leading inventor. His innovative methods are paving the way for advancements in nanofabrication technologies.