Vienna, Austria

Christoph Spengler

This inventor holds 17 USPTO granted patents and 2 published patent applications and 9 EPO patents, primarily in Charged-Particle Processing. Top assignees: Ims Nanofabrication Gmbh, Ims Nanofabrication Ag. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christoph Spengler. Retrieved from https://idiyas.com/inventor/christoph-spengler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 76.5

 

Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 70(Granted Patents)


Location History:

  • Innsbruck, AT (2017)
  • Vienna, AT (2019 - 2024)

Company Filing History:


Years Active: 2017-2026

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Areas of Expertise:
Multi-Beam Writer
Charged-Particle Source
Electromagnetic Lens
Image Distortion
Thermal Control
Pattern Definition
Dose-Dependent Correction
Feature Reshaping
Blur Variation
Exposure Pattern
Thermal Expansion
17 patents (USPTO):Explore Patents

Title: Innovator Christoph Spengler: Pioneering Advances in Charged-Particle Technology

Introduction: Christoph Spengler, an inventor based in Vienna, Austria, holds a remarkable portfolio of nine patents in the field of charged-particle technology and data processing. His innovative contributions have significantly advanced the capabilities of programmable direct-write apparatuses and will be explored in detail.

Latest Patents: One of Spengler's latest patents encompasses a sophisticated system for pattern data processing in a programmable direct-write apparatus. This process involves writing a desired pattern onto a target with the aid of input pattern data in vector format. The system utilizes a data preprocessing mechanism that operates independently of the writing process. It efficiently prepares intermediate pattern data by incorporating writing parameter data, thus optimizing the subsequent writing operation. This innovation streamlines the writing control system by converting intermediate pattern data into pattern streaming data for accurate application on the target.

Another significant patent from Spengler describes a charged-particle source designed to generate charged particles through a meticulously structured sequence of electrodes. This design incorporates an emitter electrode, counter electrodes, and adjustment electrodes, all arranged with rotational symmetry. It also features steering electrodes that disrupt the radial axial symmetry, effectively directing secondary charged particles away from the emission surface.

Career Highlights: Christoph Spengler has demonstrated his expertise through his work with renowned companies such as Ims Nanofabrication GmbH and Ims Nanofabrication AG. His role in these organizations underscores his leadership in technological advancements within the nanofabrication sector. He has played pivotal roles that contributed to the development of cutting-edge technologies and methodologies.

Collaborations: Throughout his career, Spengler has collaborated with notable colleagues, including Elmar Platzgummer and Wolf Naetar. Their joint efforts exemplify the synergy that can be achieved when talented individuals unite their skills and knowledge to push the boundaries of innovation.

Conclusion: Christoph Spengler stands out as an influential inventor whose work in charged-particle technology and data processing has the potential to reshape various industries. With his impressive array of patents and collaborative spirit, he continues to inspire future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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